Hiro Tanabe
Bis 1992, Process Engineer, Texas Instruments Japan, K.K.
神奈川県, Japan
Werdegang
Berufserfahrung von Hiro Tanabe
Bis heute 17 Jahre und 2 Monate, seit Mai 2007
Senior Manufacturing Engineer
Brooks Automation, Inc. / Brooks Japan ,K.K.
Technically supporting and managing those world wide manufacturing facilities, USA-HQ, Korea, China, Taiwan and Singapore.
1 Jahr und 7 Monate, Okt. 2004 - Apr. 2006
Senior Application Englineer
March Plasma Systems
• One of 3 employees for March Plasma System in Japan. • Representative in Japan of the company “March Plasma Systems” for all engineering/technical part. • Exploring new business/deal by managing a distributor. • Technical support for new and existing customers. • Operation and maintenance training for contracted service company and customers. • Product demonstration and process optimization works for PCB maker, WL-CSP maker. • Specify and finalize product specification and establish “delivery specif
6 Jahre und 7 Monate, Apr. 1995 - Okt. 2001
Supervisor, Total Product Support
Applied Materials Japan,K.K.
Supervisor, Total Product Support Group • Support SACVD product for all internal AMJ people and customer totally. • Finalize tool/process specification and make 納入仕様書 (Product specification documentation) • On site support for 1st in FAB tool and directly train for AMJ CSE and customer • Process development direct support for customer. • Take a lead of “Producer task force” project when 1st Producer tool was planned to install to the customer in Japan. • Over 80% internal/external documentations and m
2 Jahre und 8 Monate, Aug. 1992 - März 1995
Supervisor, TFT-LCD Group
Kochi CASIO K.K.
• Manage MFG, Maintenance tech for TFT-LCD product line. I had 15 people finally. • Take a lead of all dry process (Dry etch, Plasma CVD and PVD) • Make a working shift model for mass production. • Train QC and DOE model to engineer. • Work in the member of ISO800 certifucation.
2 Jahre und 4 Monate, Apr. 1990 - Juli 1992
Process Engineer
Texas Instruments Japan, K.K.
Diffusion Process Engineer in 16MB-DRAM product • Work in Hiji-plant • In the start-up team for KTI Semiconductor (joint company between Kobe-Heavy-Steel and Texas-Instruments) • Develop IG process for deep trench for 16MB-DRAM (This is still used in Micron Japan)
Ausbildung von Hiro Tanabe
4 Jahre, Apr. 1986 - März 1990
Chemical Engineering
Tokushima University
Sprachen
Japanisch
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